Structural, Optical and Electrical Properties of Plasma Deposited Thin Films from Hexamethyldisilazane Compound
نویسندگان
چکیده
منابع مشابه
Electrical Properties of Plasma Deposited Thin Films
Abstract. It is well known that MIM (metal-insulator-metal) structures exhibit various high-field processes, which may be either electrode-limited (e.g. tunneling, Schottky-barrier emission) or bulk-limited (e.g. space-charge-limited conduction, Poole-Frenkel conduction). Thin films prepared using PECVD (plasma-enhanced chemical vapour deposition)exhibited Pool-Frenkel conductivity (Schottky co...
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ژورنال
عنوان ژورنال: Acta Physica Polonica A
سال: 2011
ISSN: 0587-4246,1898-794X
DOI: 10.12693/aphyspola.119.369